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SSJR Successfully Appeals Rejection of Patent Application for a Chemical Vapor Deposition Coating Device
12 October 2011
SSJR has succeeded in securing a decision by the Board of Patent Appeals and Interferences reversing all rejections issued by the Examiner of the USPTO in an application related to a chemical vapor deposition coating device that incorporates spacers to vary a gap height in order to more precisely influence the local surface temperatures of a compensation plate. Issuance of a patent containing all pending claims is expected in due course.